Analysis of heat transfer in a chemical vapor deposition reactor: an eigenfunction expansion solution approach
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چکیده
منابع مشابه
Analysis of Heat Transfer in a Chemical Vapor Deposition Reactor : An Eigenfunction Expansion
A numerical solution procedure combining several weighted residual methods and based on global trial function expansion is developed to solve a model for the steady state gas ow eld and temperature distribution in a low-pressure chemical vapor deposition reactor. The enthalpy ux across wafer/gas boundary is calculated explicitly and is found to vary signi cantly as a function of wafer position....
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ژورنال
عنوان ژورنال: International Journal of Heat and Fluid Flow
سال: 1999
ISSN: 0142-727X
DOI: 10.1016/s0142-727x(98)10042-5